Hệ thống PLD (Pulsed Laser Deposition)

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Hệ thống PLD (Pulsed Laser Deposition) - Thiết bị lắng đọng bằng xung laser.

Hãng sản xuất: PVD Products (Mỹ)

Model: Nano PLD3000, PLD5000

Ưu điểm của phương pháp này là có thể tạo cấu trúc màng trên nhiều loại vật liệu khác nhau. Nó cho phép tạo được cấu trúc multilayer trên vật liệu gốc.

Ứng dụng: Công nghệ bán dẫn, Solar cell, mạ đặc biệt các chi tiết cơ khí...

Maximum substrate size: One 2-inch or multiple small substrates.

Maximum substrate size: One 2-inch or multiple small substrates.
Maximum substrate temperature: 950C (in oxygen) for all substrates materials in oxygen
pressure up to 400 Torr. Thermal paste required with non-rotating substrate. Thermal
paste is not required for rotating subtrates.
Temperature uniformity: ± 4oC across 2-inch diameter Si substrate
Operating Pressure Range: 5 x 10 -7
Torr base to 500 mTorr
Target Size: Four 2-inch diameter targets or eight 1-inch diameter targets.
Target to Substrate (Throw) Distance: Fixed at 75 mm, Optional Z-stage available (50 to
100 –mm).
Nominal Angle of incidence of the laser beam on target: 60o
Base Pressure of the Main Chamber: P < 5 x 10 -7
Torr guaranteed, with system at room
temperature.
Base Pressure with Load Lock: P < 5 x 10-8
Torr guaranteed, with system at room
temperature without targets in the chamber.
Operational Wavelength: 248 nm (KrF) or 193 nm (ArF) others available on request
Optical Train: Fully enclosed, includes automatic open/close of laser shutter, manual
aperture set to adjust beam size, Kinematic mirror mounts for fine positioning of beam.

Maximum substrate temperature: 950oC (in oxygen) for all substrates materials in oxygen pressure up to 400 Torr. Thermal paste required with non-rotating substrate. Thermal paste is not required for rotating subtrates.

Temperature uniformity: ± 4oC across 2-inch diameter Si substrate Operating Pressure Range:5x10-7 Torr base to 500 mTorr Target Size: Four 2-inch diameter targets or eight 1-inch diameter targets.

Target to Substrate (Throw) Distance: Fixed at 75 mm, Optional Z-stage available (50 to 100 –mm).

Nominal Angle of incidence of the laser beam on target: 60o

Base Pressure of the Main Chamber: P < 5x10-7 Torr guaranteed, with system at room temperature.

Base Pressure with Load Lock: P < 5x10-8 Torr guaranteed, with system at room temperature without targets in the chamber.

Operational Wavelength: 248 nm (KrF) or 193 nm (ArF) others available on request

Optical Train: Fully enclosed, includes automatic open/close of laser shutter, manual aperture set to adjust beam size, Kinematic mirror mounts for fine positioning of beam.